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High Resolution Telecentric Lens for Megapixel Camera FXL series |
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(Object side Telecentric) |
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| Model |
FXL-0.19X-120D-C |
FXL-1X-120D-C |
FXL-2X-100D-C |
| Magnification |
0.19X±3% |
1X±3% |
2X±3% |
| WD |
120mm±3mm |
120mm±1mm |
100mm±1mm |
| Image Direction |
Inverted Erect |
Inverted Erect |
Inverted Erect |
| Object side N.A. |
0.017 |
0.072 |
0.13 |
| F number |
6 |
7 |
8 |
| F number (Smallest Apature) |
- |
125 |
178 |
| Object side Resolving Power |
21μm |
5.2μm |
2.9μm |
| Image side Resolving Power |
4.0μm |
5.2μm |
5.7μm |
| Min Camera Pixel Size |
3.45μm |
3.45μm |
3.45μm |
| Image Circle size |
φ11mm |
φ11mm |
φ11mm |
| Camera Mount |
C-mount |
C-mount |
C-mount |
| Wave Length |
486-656nm |
486-656nm |
486-656nm |
| Distortion |
Max 0.02% or less |
Max 0.05% or less |
Max 0.05% or less |
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| *The above-mentioned data is the one simulated with changeable Apature
opened. |
| Contact us・・・sales@seiwaopt.co.jp |
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2007.09 シリコンウェハー結晶欠陥検査装置 《OSF検査装置》 |
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| シリコンウェハーのOSF結晶欠陥を微分干渉顕微鏡にて観察、数をカウントします。 |
| その他ニーズに合わせた検査装置をカスタマイズいたします。 |
| お問い合わせはください。・・・ sales@seiwaopt.co.jp |
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2006.09 Laser Processing NUV Objective Lens 20X、50X |
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NUV Plan APO Objective
Hight N.A. and Long working Distance objective Lens for NUV |
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| Specification |
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| Model |
UV Plan APO 20X |
UV Plan APO 50X |
| Glass Correction |
0 |
1.0mm |
0 |
1.0mm |
| N.A. |
0.50 |
0.52 |
| WD |
12.0 |
10.0 |
| Wave Length |
345nm−1,064nm |
| Transmission |
355nm 55%< |
355nm 50%< |
| 540nm 60%< |
540nm 70%< |
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