It measures the outer diameter of wafer cassettes FOUP/FOSB/OC (cassettes with wafers already inserted can also be measured).
Measures and inspects top flanges, side forklift flanges, wafer mounting step pitch and registration pinholes from various angles.
・Can measure FOUP/FOSB/OC from various manufacturers.
Can also inspect non-standard sizes of φ300mm and color cassettes
・25MP camera + dedicated optical engine enables high-quality outer diameter measurements!
・Ultra-wide field of view, high-speed processing realizes the fastest throughput in the industry
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[Overview]
This equipment is equipped with a laser Raman and confocal differential interference microscope that detects defects in the SiC substrate and SiC epitaxial layer at an early stage, which can cause fatal defects in the device characteristics, and provides feedback to the process.
This allows us to detect not only surface defects by Confocal DIC and epitaxial defects by PL (photoluminescence measurement), but also defects in the substrate.
In addition, by combining it with Raman spectroscopy, it provides us with more detailed defect analysis results.
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[Use]
The presence of a process-affected layer (SSD: Sub-Surface Damage) under the surface of the SiC substrate (affected from the surface to about 10um) has become an issue in recent years in terms of SiC substrate quality. If SSD remains, it can cause stacking faults during epitaxial growth on top of it and the propagation of BPD.
This equipment can measure residual stress in the depth direction of the substrate surface by Raman measurement.
It can also measure local stress near the epitaxial film and carrier concentration in the depth direction of the epitaxial film surface by Raman measurement.
[Overview]
Device for detailed analysis of NG images, storage of analysis data, and communication with host PC based on information provided by wafer inspection system.
用途
半導体デバイス・CMOSデバイス製作工程での欠陥管理
[Use]
Defect management in semiconductor device / CMOS device manufacturing process
The System takes defect images and the datum are upladed to the upstream system.
The defect infomation is provided by Wafer Review System and Wafer Inspection System; AVI.
The System also analyzes the defect information from AVI.
Seiwa SAWR Series inspect your application at high speed with high precision.
We can also manufacture AVI.
[Overview]
Simultaneously measure the amount of misalignment of the front and back patterns after double-sided exposure and the misalignment of the wafer after bonding from both sides (Top-Bottom measurement).
Measurement of alignment deviation after surface layer exposure (TOP-TOP measurement)
Cassette to cassette type and semi-auto type available
Possible to handle thin and easily warped workpieces as option.
用途
半導体デバイス
CMOSデバイス
センサーデバイス製造工程での表裏パターンニング精度管理」
[Use]
Semiconductor device
CMOS device
Front and back patterning accuracy control in
sensor device manufacturing process
[Overview]
Inspect and find the position of No (absent) ball after reflow,
remount solder ball and perform soldering directly by laser to the proper position.
仕様
検査 ;On Fry検査
ボール搭載 ;1SEC以下
搭載レーザー;LDレーザー
[Specification]
Inspection ; On Fry inspection
Ball mounted; 1sec or less
Onboard laser; LD laser